What kind of resists can be used? What are the required properties of the resist ?

Our DLW instrument is capable of writing into a broad range of photosensitive materials. We develop and continuously extend the list of tested positive and negative photoresists for the multi-photon-absorption writing process. The processing capability for the following photoresist has been approved for two photon lithography: SU-8 (negative tone), Ormocere (negative tone), AZ5214 (negative tone), IP-L, IP-G (negative tone), As₂S₃ (negative tone), AZ MiR 701 (positive tone), AR-P-3120 (positive tone) and AZ 9260 (positive tone).

In general the resist has to be transparent at the laser wavelength at 780nm and has to absorb at the 2-photon wavelength of 390nm.

For casting of photoresist structures to different materials please refer to the casting and coating paragraph.

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