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A C H I S W Y

• What kind of resists can be used? What are the required properties of the resist ?
  Our DLW instrument is capable of writing into a broad range of photosensitive materials. We develop and continuously extend the list of tested positive and ...
• When the ScanMode is set to '1' which enables both Piezo and Linear stage movement for writing, is it not possible to write structures less than 300 um without Linear stage movement? When ScanMode is set to '1', the Piezo does not move but all movement is controlled by the Linear Stage alone?
  In Scanmode 1 the lateral movements are performed by the motorized stage with a precision of 1 µm. The axial movement of the sample is ...
• What is the minimum achievable feature size and resolution?
  The minimum feature sizes of structures fabricated by using Nanoscribe's Photonic Professional laser lithography system strongly depend on the photoresist which is used.For example, SU-8, ...
• What are the working conditions for the Nanoscribe Photonic Professional System?
  To avoid exposure of the resist by ambient light, we recommend yellow light illumination. If an optical table was ordered from us, compressed air with a ...
• What is the maximum writing area?
  The maximum accesible area measures 100 x 100 mm² for our standard substrate holder in combination with the motorized scanning stage of the system. These ...
• What is the scanning/writing speed?
  The maximum writing speed for getting reasonable feature quality depends on the minium bends of your structures. Straight lines may be written with maximum speed. ...
• What are the requirements and conditions for the substrate?
  What kind of substrate materials can be used? A variety of substrate materials can be used. Our standard substrate is a 30mm diameter glass microscope ...